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Publikationen

  • R. Muydinov, S. Seeger, B. Kumar, C.Klimm, R.Kraehnert, M. Wagner, B. Szyszka:Crystallisation behaviour of CH3NH3PbI3 films: The benefits of sub-second flash lamp annealing

       Thin Solid Films 653 (2018), p. 204-214

  • M. Weise, S. Seeger, K. Harbauer, T. Welzel, K. Ellmer: A multifunctional plasma and deposition sensor for the characterization of plasma sources for film deposition and etching

        Appl. Phys. 122 (2017), 044503

  • S. Seeger, K. Ellmer, M. Weise, J. Reck, R. Mientus:
    Voltage-controlled reactive magnetron sputtering of Nb-doped TiO2 films: electrical and optical properties

    MRS Advances (2016)

  • S. Seeger, K. Ellmer, M. Weise, D. Gogova, D. Abou-Ras, R. Mientus: Reactive magnetron sputtering of Nb-doped TiO2 films: relation between structure, composition and electrical properties

    Thin Solid Films 605, (2016), p. 44 – 52

  • H. Scherg-Kurmes, S. Seeger, S. Körner, Bernd Rech, R. Schlatmann, Bernd Szyszka:
    Optimization of the post-deposition annealing process of high mobility In2O3:H for photovoltaic applications

    Thin Solid Films 599, (2016), p. 78 – 83

  • J. Reck, S. Seeger, M. Weise, R. Mientus, J. Schulte, K. Ellmer:
    Flash-lamp annealing of ZnO_layers on copper-indium-gallium-sulphide layers: A spectroscopic ellipsometry study

    Thin Solid Films 571 (2014), p. 762 - 766 >

  • Seeger, S. ; Ellmer, K. ; Reck, J.; Schulte, J.; Helm, P.:
    Modification of the Surface of Cu(In,Ga)S2 Absorbers by Shallow Zinc-Profiles :

    28th European Photovoltaic Solar Energy Conference and Exhibition, Paris (2013), p. 2463

  • Brunken, S. ; Mientus, R. ; Ellmer, K.:
    Metal-sulfide assisted rapid crystallisation of highly (001)-textured tungsten disulphide (WS2) films on metallic back contacts:

    Phys. Status Solidi A- 1-6 (2011) p.1

  • Brunken, S. ; Mientus, R. ; Ellmer, K.:
    In-situ energy-dispersive X-ray diffraction of metal sulfide assisted crystallization of strongly (001) textured

    photoactive tungsten disulfide thin films,

    Thin Solid Films 517 (2009), p. 3148-3151 doi:10.1016/j.tsf.2008.11.118

  • Brunken, S. ; Mientus, R, ; Seeger, S. ; Ellmer, K.:
    The mechanism of nickel sulfide induced rapid crystallization of highly textured tungsten disulfide (WS2) thin films: An in situ real-time diffraction study;

    Journal of Applied Physics 103 (2008), p. 063501/1-6 doi:10.1063/1.2875679 Open Access Version

  • Ellmer, K.. ; Mientus, R.:
    Carrier transport in polycrystalline transparent conductive oxides: A comparative study of zinc oxide and indium oxide

    Thin Solid Films 516 (2008), p. 4620-4627 doi:10.1016/j.tsf.2007.05.084

  • Ellmer, K. ; Mientus, R.:
    Carrier transport in polycrystalline ITO and ZnO:Al II: The Influence of grain barriers and boundaries;

    Thin Solid Films 516 (2008), p. 5829-5835

  • Wolf, R. ; Wandel, K. ; Boeffel, C.:
    Moisture Barrier Films Deposited on PET by ICPECVD of SiNx; Plasma Processes and Polymers Vol.4  (2007) Supplement 1, 185-189.

  • Weiß, V. ; Seeger, S. ; Ellmer, K. ; Mientus, R.:
    Reactive magnetron sputtering of tungsten disulfide (WS2-x) films: Influence of deposition parameters on texture, microstructure, and stoichiometry;

    Journal of Applied Physics 101 (2007), p. 103502/1-9 doi:10.1063/1.2716395

  • Ellmer, K. ; Seeger, S. ; Mientus, R.:
    Rapid crystallization of WS2 films assisted by a thin nickel layer: An in situ energy-dispersive X-ray diffraction study;

    Physica Status Solidi A 203 (2006), p. 2457-2462 doi:10.1002/pssa.200622016

  • Ellmer, K.; Seeger, S.; Sieber, I.; Bohne, W.; Röhrich, J.; Strub, E.; Mientus, R.:
    Reactive magnetron sputtering of highly (001)-textured WS2-x films: Influence of Ne+, Ar+ and Xe+ ion bombardment on the film growth; Physica Status Solidi A 203 (2006), S. 497-503

  • G. Kaden, M. Mai:
    Determination of Surface Recombination Velocity so and Carrier Lifetime τo from IF(VG) Characteristics of Al/PECVD-SiNx/pn-GaAs Gated Diodes / Semiconductor science technology 20, 1-7, 2005

  • G. Kaden, M. Mai:
    Determination of Monitority Carrier Lifetime τP and Surface Recombination Velocity s0 of AIIIBV p-n Junctions from the Forward Current Characteristics IF(VF) / Semiconductor science technology 20, 2005, S.1136-1142

  • Mientus, R. ; Ellmer, K.:
    Elektrische und optische Eigenschaften reaktiv gesputterter In0,9Sn0,1Ox-Schichten (ITO); Workshop 2005 Hahn-Meitner-Institut (HMI)

  • Seeger, S. ; Mientus, R. ; Ellmer, K.:
    Influence of the ion energy on the growth of WSx films prepared by reactive magnetron sputtering; HASYLAB annual report 2004., 2005, S. 498-498

  • Seeger, S. ; Mientus, R. ; Röhrich, J. ; Strub, E. ; Bohne, W. ; Ellmer, K.: Electrical and optical properties of highly (001) textured WSx films deposited by reactive magnetron sputtering; Surfaces and coatings Technology 200 (2005), S. 218-221

  • Mientus, R.; Grötschel, R.; Ellmer, K.:
    Optical and electronic properties of CrOxNy films, deposited by reactive DC magnetron sputtering in Ar/N2/O2(N2O) atmospheres; Surface and Coatings Technology 200 (2005), S. 341-345

  • Voigt, A. ; Heinrich, M. ; Hauck, K. ; Mientus, R. ; Gruetzner, G. ; Töpper, M. ; Ehrmann, O.:
    A Single Layer Negative Tone Lift-Off Photo Resist for Patterning a Magnetron Sputtered Ti/Pt/Au Contact System and for Solder Bumps; Microelectron. Eng. 78-79 (2005) S. 503-508

  • Weiss, V. ; Bohne, W. ; Röhrich, J. ; Strub, E. ; Bloeck, U. ; Sieber, I. ; Ellmer, K. ; Mientus, R., Porsch, F.:
    Reactive magnetron sputtering of molybdenum sulfide thin films: In situ synchrotron x-ray diffraction and transmission electron microscopy study ; Journal of Applied Physics, 95, 12, Juni 2004, S. 7665

  • Ellmer, K.; Mientus, R.; Seeger, S.; Weiß, V.: Highly (001)-textured WS2-x films prepared by reactive radio frequency magnetron sputtering; Physica Status Solidi A 201 (2004), S. R97-R100

  • Weiß, V. ; Mientus, R. ; Ellmer, K.:
    Texture of polycrystalline MoSx thin films magnetron sputtered from a metallic target in Ar-H2S atmospheres; In: DeHaven P.W. [u.a.] [Eds.] : Magnetic and electronic films - microstructure, texture, and application to data storage : symposia held at the MRS spring meeting, April 1 - 4, 2002, San Francisco, California, U.S.A.. Warrendale, Pa: Materials Research Society, 2002 (Materials Research Society symposium proceedings ; 721), S. 131-136

  • Mientus R. ; Sieber I. ; Ellmer K.:
    Structure and morphology of reactively sputtered In0.9Sn0.1Ox layers; In: DeHaven P.W. [u.a.] [Eds.] : Magnetic and electronic films - microstructure, texture, and application to data storage : symposia held at the MRS spring meeting, April 1 - 4, 2002, San Francisco, California, U.S.A.. Warrendale, Pa: Materials Research Society, 2002 (Materials Research Society symposium proceedings ; 721), S. 151-156

  • Wolf, R. ; Wandel, K. ; Gruska, B.: Low temperature ICPECVD of silicon nitride in SiH4 NH3 Ar discharges analysed by spectroscopic ellipsometry and etch behavior in KOH and BHF; Surface and Coatings Technology Vol. (142-144)(2001) 786-791.

  • Ellmer K. ; Mientus R. ; Rossner H.: In situ investigation by energy dispersive X-ray diffraction (EDXRD) of the growth of magnetron sputtered ITO films; Surface and Coatings Technology 142-144 (2001), S. 1094-1099

  • Ellmer K. ; Mientus R. ; Weiß V. ; Rossner H.: Setup for in situ X-ray diffraction studies of thin film growth by magnetron sputtering; Nuclear Instruments and Methods in Physics Research A 467-468 (2001), S. 1041-1044

  • Wolf, R. ; Gruska, B. ; Wandel, K.:
    KOH etch rate and optical properties of ICPECVD silicon nitride; MicroMat 2000, Berlin 17.-19.April,  Abstract: ISBN 3-932434-14-5, S. 424

  • Wolf, R. ; Wandel, K.:
    Plasma Chemical Vapor Deposition of SiNx Films in SiH4-N2-He Discharges by RF and VHF frequencies; Proc. ISPC-14 Praha (1999) Vol. III, S. 1427

  • Mientus, R. ;Wolf, R. ; Kloth, B. ; Protsch, M. ; Pikhtin, A.N.:
    A highly UV-selective Schottky-barrier photodiode based on a Ag–GaP contact: Surface and Coatings Technology 116–119 (1999) S. 711–715

  • Ellmer, K. ; Mientus, R.:
    Calorimetric measurements with a heat flux transducer of the total power influx onto a substrate during magnetron sputtering: Surface and Coatings Technology 116–119 (1999) S. 1102–1106

  • Mientus, R. ; Ellmer, K. :
    Reactive DC magnetron sputtering of elemental targets in Ar/N2 mixtures: relation between the discharge characteristics and the heat of formation of the corresponding nitrides; Surface and Coatings Technology 116–119 (1999) S. 1093–1101

  • Mientus, R. ; Ellmer, K. :
    Structural, electrical and optical properties of Sn02_x:F-layers deposited by DC-reactive magnetron-sputtering from a metallic target in Ar-02/CF4 mixtures; Surface and Coatings Technology 98 ( 1998) 1267-1271

  • Ellmer, K. ; Kudella, F. ; Mientus, R. ;Schieck, R. ; Fiechter, S.:
    Influence of discharge parameters on the layer properties of reactive magnetron sputtered ZnO:Al films; Thin Solid Films 247 (1994) 15-23

  • Ellmer, K. ; Kudella, F. ; Mientus, R. ;Schieck, R. ; Fiechter, S.:
    Reactive magnetron sputtering of Al doped ZnO films: dependence of optical, electrical, compositional and structural properties on deposition conditions; Applied Surface Science 70/71 (1993) 707-711