Flash Lamp Annealing (FLA):

FLA carries thermal energy into solid films in extremely short pulses (µs to ms).
The thermal energy input into the material depends on the length and energy density of the pulse.

Technical data:

  • DTF - FLA100 - system
  • irradiated area: 4“ (100 mm)
  • energy density: 0.1 J/cm² - 22 J/cm²
  • Pulse length: (0,4 - 3) ms
  • Xe-flash lamp spectrum: UV-VIS-NIR

DTF FLA100
Applications:
  • realizing shallow dopant profiles
  • annealing process for temperature-sensitive devices and substrates


Vacuum chamber and
lamp housing of FLA 100